AmandaÌýHoskins

  • PhD Candidate
  • ATOMIC LAYER DEPOSITION
Address

Department of Chemical and Biological Engineering; Office D1B70
University of Colorado
3415 Colorado Avenue, 80303
JSCBB Campus Box 596 UCB
​Boulder, CO 80309-0596

Education

  • B.S., Chemical Engineering, Rochester Institute of Technology
  • M.S., Chemical Engineering, Â鶹Ãâ·Ñ°æÏÂÔØ

Amanda graduated from Rochester Institute of Technology with her B.S. in Chemical Engineering in May 2014. She has worked as a co-op for Bristol-Myers Squibb and Xerox as well as more than 3 years of research during her undergraduate career. She is currently pursuing a PhD in Chemical Engineering and joined Team Weimer in the fall of 2014. Her research focuses on the use of atomic layer deposition as a method to form nano-structuredÌýceramic coatings for high temperature stabilization of materials. She uses a combined computational and experimental approach to fully understand and synthesize containment materials for high temperature solar-thermal water splitting.

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